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Help us to address the upcoming scaling challenges! As Researcher Extreme Ultraviolet Lithography and Reticles, you examine innovative solutions and technologies to enable next-generation EUV lithography and chip advancements. You improve their performance through a combination of experimental work and simulations.
The Ångström Patterning Department is exploring, developing, and optimizing advanced lithography/patterning solutions to enable the chip scaling roadmaps. One of the key technologies enable single digit nanometer dimensions on chip is EUV (extreme-ultraviolet) lithography. This is made possible by the most advanced equipment from imec’s strategic partner ASML. Together with world-leading industry partners at imec, we address the upcoming scaling challenges associated with EUV patterning and the EUV reticle more specifically. Within this context, we are looking for a Researcher EUV Lithography and Reticles.
We offer you the opportunity to join one of the world’s premier research centers in nanotechnology at its headquarters in Leuven, Belgium. With your talent, passion and expertise, you’ll become part of a team that makes the impossible possible. Together, we shape the technology that will determine the society of tomorrow.
We are committed to being an inclusive employer and proud of our open, multicultural, and informal working environment with ample possibilities to take initiative and show responsibility. We commit to supporting and guiding you in this process; not only with words but also with tangible actions. Through imec.academy, 'our corporate university', we actively invest in your development to further your technical and personal growth.
We are aware that your valuable contribution makes imec a top player in its field. Your energy and commitment are therefore appreciated by means of a market appropriate salary with many fringe benefits.
The combination of our widely acclaimed leadership in microchip technology and profound software and ICT expertise is what makes us unique.
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