Postdoc: Computational Imaging using Digital Holographic Microscopy

Work Activities
Optical metrology is a key ingredient of nanolithography, as it enables control of important parameters like overlay. High-resolution imaging is an essential part of optical metrology since metrology is often done on small test patterns that are surrounded by device structures.
Digital Holographic Microscopy (DHM) is a promising approach for optical metrology, as it can computationally correct imaging errors that are caused by small imperfections in the imaging optics. In this way, DHM offers the near perfect imaging conditions that is required for accurate and robust metrology.
As a postdoc, you will push DHM metrology capabilities to new unexplored limits by investigating new (computational) enhancements of DHM that will further boost the overlay metrology performance on highly challenging test cases. You will test your ideas on a DHM setup using industry-relevant test samples. You will also work in close collaboration with a PhD candidate in our group and a Ph.D. candidate at the biophotonics group at the VU (LaserLaB - Biophotonics and Microscopy - Profiles - Vrije Universiteit Amsterdam). You will also regularly interact with our stakeholders in industry since the results of your research will pave the way for better metrology tools for tomorrow’s nanolithography.
Qualifications
You have a PhD in Physics, Electrical Engineering, or a related field and experience in optics. You are motivated, independent, and have good project management skills. Good verbal and written communication skills (in English) are required. Experience with optical setups are considered an advantage for the project.
Work environment
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl
The Computational Imaging group at ARCNL is part of the ARCNL metrology research department and explores advanced imaging techniques that offer solutions to various complex optical metrology challenges in the semiconductor manufacturing industry.
Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 2 years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
More information?
For further information about the position, please contact Arie den Boef (arie.den.boef@asml.com) or Simon Mathijssen (simon.mathijssen@asml.com)
Application
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Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
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